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Title : Dynamic IR Drop and Silicon Success in Nanometer Designs
Company : Nassda
File Name : DynamicIRDropWP.pdf
Size : 264425
Type : application/pdf
Date : 02-Jun-2004
Downloads : 4



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In the move to advanced nanometer process technologies 130 nanometers and below, semiconductor designers face a host of electrical and physical problems not encountered with older manufacturing technologies.
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