News Jobs Papers Downloads Companies Books Events Resources Forums Submit RSS Audio Interviews Universities
Newsgroups Subscribe
All Categories : Technical Papers Bookmark and Share

Title : Dynamic IR Drop and Silicon Success in Nanometer Designs
Company : Nassda
File Name : DynamicIRDropWP.pdf
Size : 264425
Type : application/pdf
Date : 02-Jun-2004
Downloads : 103



If download does not start, click here.
Rate This File
5 Stars
4 Stars
3 Stars
2 Stars
1 Star

In the move to advanced nanometer process technologies 130 nanometers and below, semiconductor designers face a host of electrical and physical problems not encountered with older manufacturing technologies.
User Reviews More Reviews Review This File
http://www.nanotechcafe.com

Featured Video
Submit | More Videos 
Jobs
Field Applications Engineer for Real Intent at Sunnyvale, CA
AE's P&R San Diego and Austin for EDA Careers at San Jose, CA
Strategic Account Manager for Atrenta at San Jose, CA
Sr. Field Applications Engineer (San Jose, CA & Austin, TX) for Atrenta at San Jose, CA
Sr. Product/Technical Marketing Manager - BugScope for Atrenta at San Jose, CA
AE's BACK END AUSTIN, SOCAL Bay Area for EDA Careers at San Jose, CA
Submit Resume | Post Jobs | More Jobs 



Click here for Internet Business Systems © 2013 Internet Business Systems, Inc.
595 Millich Dr., Suite 210, Campbell, CA 95008
+1 (408) 850-9201 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and EngineeringEDACafe - Electronic Design AutomationGISCafe - Geographical Information Services MCADCafe - Mechanical Design and EngineeringTechJobsCafe - Technical Jobs and ResumesShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy Policy