|
||||||||||
|
Oxidation of silicon is a common and frequent step in the manufacture of integrated circuits (IC). The success or failure of the IC manufacturer often depends on the ability to grow a uniform oxide film quickly and repeatedly. Water vapor is commonly used to grow oxides. RASIRC has developed a new device to deliver water vapor to oxidation furnaces.
|
|
|||||||||
|
||||||||||
|
||||||||||
