DUBLIN — (BUSINESS WIRE) — April 12, 2012 — Research and Markets ( http://www.researchandmarkets.com/research/36a965dc/atomic_layer_depos) has announced the addition of John Wiley and Sons Ltd's new book " Atomic Layer Deposition of Nanostructured Materials" to their offering.
Clearly structured, the introductory part of this first book on ALD provides a great insight into all aspects of the technique, while the second part focuses on nanomaterials and fields of application. As a result, readers and users are led from the fundamental processes and uses of the technique to building nanostructures in various important fields of academic and industrial significance.
Key Topics Covered:
1 Theoretical Modeling of ALD Processes
2 Step Coverage in ALD
3 Precursors for ALD Processes
4 Sol-Gel Chemistry and Atomic Layer Deposition
5 Molecular Layer Deposition of Hybrid Organic-Inorganic Films
6 Low-Temperature Atomic Layer Deposition
7 Plasma Atomic Layer Deposition
8 Atomic Layer Deposition for Microelectronic Applications
9 Nanopatterning by Area-Selective Atomic Layer Deposition
10 Coatings on High Aspect Ratio Structures
11 Coatings of Nanoparticles and Nanowires
12 Atomic Layer Deposition on Soft Materials
13 Application of ALD to Biomaterials and Biocompatible Coatings
14 Coating of Carbon Nanotubes
15 Inverse Opal Photonics
16 Nanolaminates
17 Challenges in Atomic Layer Deposition
Authors
Nicola Pinna, Mato Knez
For more information, including full table of contents, please visit http://www.researchandmarkets.com/research/36a965dc/atomic_layer_depos
Source: John Wiley and Sons Ltd
Contact:
Research and Markets
Laura Wood, Senior Manager
Email Contact
U.S.
Fax: 646-607-1907
Fax (outside U.S.): 353-1-481-1716
Sector:
Process
and Materials,
Nanotechnology


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