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The Semiconductor Technology research is hosted in modern clean room facilities over 350 m² with 6" CMOS compatible equipment. In the area of nanolithography, research on Interference Lithography is carried out for high throughput and highly periodic structures. Electron-Beam lithography, down to sub 10 nm features, is the chosen method for direct writing and master fabrication for Nanoimprint, which itself is a promising low-cost replication technology for arbitrary structures at the e-beam resolution limit. Basic research in these fields is underway to improve all methods in terms of resolution, precision and reliability.
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